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Copper Infiltrated Diamond Metal Matrix Composite (Cu-Diamond) for Semiconductor Laser / LED
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Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond that is produced using the CVD process. In this process, a mixture of carbon-containing gases is decomposed under controlled conditions, resulting in the formation of a single crystal diamond layer on a substrate.

Single crystal diamond CVD is known for its exceptional hardness and thermal conductivity, which makes it useful for a range of industrial and scientific applications, such as cutting and grinding tools, heat spreaders, and optical components.

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In summary, single crystal diamond CVD is a type of synthetic diamond that is produced using the CVD process and is characterized by its exceptional hardness and thermal conductivity. It has a wide range of applications in industries such as manufacturing, electronics, and optics.
 
 
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Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond that is produced using the CVD process.

Single crystal diamond CVD is known for its exceptional hardness and thermal conductivity, which makes it useful for a range of industrial and scientific applications, such as cutting and grinding tools, heat spreaders, and optical components.

Compared to other forms of synthetic diamond, single crystal diamond CVD has a highly ordered crystal structure, which gives it improved physical and mechanical properties. This makes it a desirable material for a range of high-performance applications, where its hardness and thermal conductivity are important factors.
 
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Copper Infiltrated Diamond Metal Matrix Composite (Cu-Diamond) for Semiconductor Laser / LED

Our Diamond-Copper Composite (Cu-Diamond) is a high-performance thermal management material manufactured by powder metallurgy – mixing diamond particles with copper powder, followed by high-temperature high-pressure (HTHP) or spark plasma sintering (SPS) process. It combines the ultra-high thermal conductivity of diamond with the excellent workability of copper, offering an ideal solution for next-generation high-power electronic devices.

By coating a metal film on the surface of diamond, diamond is endowed with conductivity, affinity for metals, and wettability, which can improve the physical and chemical properties of the material surface and enhance its compressive strength. We can produce Coated Diamond with coatings of gold, copper, nickel, and other materials.
 
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Copper Infiltrated Diamond Metal Matrix Composite (Cu-Diamond) for Semiconductor Laser / LED

Product Overview


Our Diamond-Copper Composite (Cu-Diamond) is a high-performance thermal management material manufactured by powder metallurgy – mixing diamond particles with copper powder, followed by high-temperature high-pressure (HTHP) or spark plasma sintering (SPS) process. It combines the ultra-high thermal conductivity of diamond with the excellent workability of copper, offering an ideal solution for next-generation high-power electronic devices.

Copper Infiltrated Diamond Metal Matrix Composite (Cu-Diamond) for Semiconductor Laser / LEDCopper Infiltrated Diamond Metal Matrix Composite (Cu-Diamond) for Semiconductor Laser / LED

Key Features

  • Ultra-High Thermal Conductivity
    Achieves 600–950 W/(m·K) – 1.5 to 2.5 times higher than pure copper (400 W/(m·K)).

  • Tailored CTE (Coefficient of Thermal Expansion)
    Tunable from 5 to 10×10-6/K, precisely matching GaN, SiC, and Si chips. This minimizes thermal stress and improves long-term reliability.

  • Low Density & Lightweight
    Density 5.0–7.0 g/cm³ – about 40% lighter than conventional W-Cu alloys.

  • Good Mechanical Strength
    Bending strength > 278 MPa, excellent thermal cycling stability (performance drop <1% after 100 cycles).

  • Surface Metalization Compatible
    Ready for direct bonding or soldering onto chips and heat sinks.

Typical Specifications

Parameter Value Range
Thermal Conductivity 600 – 950 W/(m·K) (customizable up to 1000+)
CTE (25–200°C) 5 – 10 ×10-6/K (adjustable by diamond volume fraction)
Density 5.0 – 7.0 g/cm³
Bending Strength > 278 MPa
Diamond Volume Fraction 40% – 70%
Surface Roughness (Ra) ≤ 0.1 μm (polished)
Standard Thickness 0.3 – 5.0 mm (custom available)
Max. Size Up to 100×100 mm or custom shape

Applications

  • AI & High-Performance Computing
    Heat spreader for GPUs, AI accelerators, CPUs – reduces hotspot temperature by 10–20℃.

  • Power Electronics
    Substrate or heat sink for IGBT, MOSFET, SiC power modules in EV (electric vehicles) and high-speed rail.

  • 5G / RF Communication
    Thermal management for RF power amplifiers in 5G base stations and phased array radar.

  • High-Power Lasers
    Heat sink for laser diodes and fiber laser systems – CTE matches laser chip for stable output.

  • Aerospace & Defense
    Lightweight, high-thermal-conductivity packaging for satellites, avionics, and missile electronics.

Manufacturing Process (Brief)

We use powder pressing + high-temperature sintering with advanced interface modification. Diamond particles are pre-coated with carbide-forming elements (Cr, Ti, W) to ensure strong bonding with copper matrix. This key step raises thermal conductivity from ~127 W/(m·K) (untreated) to over 600 W/(m·K).

Why Choose Us?

  • Customizable: CTE, size, thickness, and diamond volume fraction tailored to your chip design.

  • Cost-Effective: Mass production capability with competitive pricing.

  • Quality Assurance: 100% inspection of thermal conductivity, CTE, and density before shipment.

  • Fast Lead Time: Samples in 7–10 days, mass production in 3–4 weeks.

Order & Customization Information

  • MOQ: 10 pieces (sample order accepted)

  • Sample Policy: Samples available – please contact for pricing

  • Customization: OEM & ODM – drawing or sample based

  • Lead Time: 10–20 working days after order confirmation


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