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Semicircular
INFI
Semi-circular shape of mechanical-grade single crystal CVD diamond offer:
✓ Maximum hardness and wear resilience
✓ High strength/elastic modulus
✓ Optimal thermal transfer
✓ Chemical/corrosion immunity
✓ Low friction and anti-adhesion
Certified for precision cutting applications.
Application Scope:
• Diamond dressing systems
• Water jet nozzle components
• Wire drawing die inserts
• Cutting/milling tooling
Configurable Dimensions:
Length capacity: ≤20mm
Width capacity: ≤7mm
Standard thicknesses: 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1.2, 1.5, 1.7, 2.0mm
Orientation/shape personalization
Technical Production:
Synthetic diamond (lab-grown/CVD/chemical vapor deposition diamond) is manufactured artificially. Two primary methods exist:
HPHT: High-pressure (5 GPa) high-temperature (1500°C) press-based synthesis
CVD: Low-pressure (<27 kPa) substrate deposition providing:
*Large-area coverage
*Material property control
*Versatile substrate compatibility
| Available size | 2~20mm |
| Available thickness | 0.2mm - 3mm |
| Lateral tolerance | +0.15,-0mm |
| Thickness tolerance | +0.1,-0.05mm |
| Face orientation | {100}> or {110} |
| Crystallographic Orientation(Miscut) | ±3° |
| Surface finish | Polished,Ra<10nm |
| Edges | Laser Cut |
| Laser Kerf | <3° |
Semi-circular shape of mechanical-grade single crystal CVD diamond offer:
✓ Maximum hardness and wear resilience
✓ High strength/elastic modulus
✓ Optimal thermal transfer
✓ Chemical/corrosion immunity
✓ Low friction and anti-adhesion
Certified for precision cutting applications.
Application Scope:
• Diamond dressing systems
• Water jet nozzle components
• Wire drawing die inserts
• Cutting/milling tooling
Configurable Dimensions:
Length capacity: ≤20mm
Width capacity: ≤7mm
Standard thicknesses: 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1.2, 1.5, 1.7, 2.0mm
Orientation/shape personalization
Technical Production:
Synthetic diamond (lab-grown/CVD/chemical vapor deposition diamond) is manufactured artificially. Two primary methods exist:
HPHT: High-pressure (5 GPa) high-temperature (1500°C) press-based synthesis
CVD: Low-pressure (<27 kPa) substrate deposition providing:
*Large-area coverage
*Material property control
*Versatile substrate compatibility
| Available size | 2~20mm |
| Available thickness | 0.2mm - 3mm |
| Lateral tolerance | +0.15,-0mm |
| Thickness tolerance | +0.1,-0.05mm |
| Face orientation | {100}> or {110} |
| Crystallographic Orientation(Miscut) | ±3° |
| Surface finish | Polished,Ra<10nm |
| Edges | Laser Cut |
| Laser Kerf | <3° |
